How was the new Molecular Vapor Deposition (MVD) technology developed for protecting electronic circuit boards?

The Molecular Vapor Deposition (MVD®) process was found in 2003 by the SPTS MVD group located in San Jose, California.

SPTS provided Nano-film technology processing, equipment and coating services, supplying to multiple markets including:

  •  MEMS (Microelectromechanical systems)
  • Semiconductors
  •  Industrial Inkjet Heads
  •  Display Technology
  •  Advanced Packaging
  •  Data Storage Industry
  •  Biomedical
  • Genome Sequencing
  • µfluidics

How is the MVD coating process used in the different industries?

The MVD process provides low temperature vapor deposited coatings with many different properties in many sectors.

Examples of MVD coating include:

Surface Energy Control

  • Anti-stiction
  • Hydrophobic
  • Hydrophilic
  • Oleophobic
  • Oleophilic
  • Lubrication
  • Bio-functional layer

Device Protection / Package Sealing

  • Moisture barrier
  • Corrosion barrier
  • Chemical barrier
  • Gas/Oxygen barrier

Optical Films

  • Anti-reflection coatings

 Dielectric Films

  • Electrical insulation
  • Conformal films on high A/R

Adhesion

  • Adhesion promotion
  • Improved thermal stability
  • Improved mechanical durability

The MVD process offers great flexibility of processing thin films and it has now been considered for electronics protection. 


What is Molecular Vapour Deposition (MVD)?

The MVD process produces a highly conformal thin film coating that is typically less than 100nm.

The coating provides excellent barrier properties and surface energy control.

The film is built up of alternating layers of ALD and CVD thin coating layers. The ALD is a ceramic-based material providing the insulating properties and the CVD film provides the barrier protection.

Once the required film thickness is achieved then a final hydrophobic layer is applied that combines with the ALD and CVD layers to provide a highly effective barrier.


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